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Advanced Lithography for Semiconductors: the cutting edge ... with Harry Levinson, SPIE

 Harry Levinson     SPIE
  9616      Mar 8, 2012
Lithography is the engine of Moore’s Law. Each year scientists and engineers from around the world descend on the SPIE Advanced Lithography conference in San Jose, California to find out what others are working on and what their progress has been. In this video, semiconductor lithographer Harry Levinson discusses the most important trends to emerge this year. We cover EUV, DSA (Directed Self Assembly), maskless lithography, e-beam, imprint and more.
About weVISION: weVISION is a series of video interviews of visionaries by G Dan Hutcheson, his career spans more than thirty years, in which he became a well-known as a visionary for helping companies make businesses out of technology. This includes hundreds of successful programs involving product development, positioning, and launch in Semiconductor, Technology, Medicine, Energy, Business, High Tech, Environment, Electronics, healthcare and Business divisions.

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