Prev Next

Conquering LER with computational metrology ... a conversation with Chris Mack of Fractilia

 Chris Mack     Fractilia
  33890      Aug 16, 2017
Line Edge Roughness, or LER, increasingly became a problem in semiconductor lithography as critical dimensions dropped below 28nm, blew past 14nm, and are now headed below 10nm. The problem is greater than process control because LER is still difficult to measure with CD SEMs because of white noise from the SEM itself. So you’re never sure a measurement indicates how bad the roughness in a line is, as the imaged roughness could be just an artifact of SEM noise and not real because the two lie in the same bathtub of data. So a process engineer could be throwing out the baby with the bath water. So what if you could separate the two … the SEM noise from the LER, that is … so you could get an accurate measurement of true variation in a line patterned on the silicon? That’s a problem that Chris Mack, legendary in lithography circles, has attacked and now has a solution with computational metrology. He’s got a new start-up, called Fractilia and we find what it’s all about today in this conversation between him and Dan Hutcheson.

To find out more about Chris’ new company, click here: https://www.fractilia.com/

To learn more about semiconductor lithography, check out Chris’s personal website here: http://www.lithoguru.com/scientist/lithobasics.html

About weVISION: weVISION is a series of video interviews of visionaries by G Dan Hutcheson, his career spans more than thirty years, in which he became a well-known as a visionary for helping companies make businesses out of technology. This includes hundreds of successful programs involving product development, positioning, and launch in Semiconductor, Technology, Medicine, Energy, Business, High Tech, Environment, Electronics, healthcare and Business divisions.

You may like this also:

...
17 August, 2019
Andrea Lati
16 August, 2019

Celtic-Next Proposers Day

The Proposal of Celtic-Next is the cost-effective deployment of applications & advanced data-analytic capabilities for resource utilization & also faster low latency content delive

Erkki Harjula
16 August, 2019
...
15 August, 2019
Mike Cowan
14 August, 2019

Vulnerability Assessment of an IP Camera

We have conducted a vulnerability assessment on an IP camera. We have used the Code of Practice-goals to aid us in the assessment and increasing its coverage & the general efficien

Alexander Manske
14 August, 2019

Risk Management in Technology (RMiT)

Technology risk refers to risks emanating from the use of information technology (IT) & the Internet. These risks arise from failures of IT systems, applications, etc.

...
13 August, 2019
Shuming Cheng
12 August, 2019

Recent weVISIONs

Tom Caulfield on what's next at GLOBALFOUNDRIES
Tom CaulfieldGLOBALFOUNDRIES
22 July, 2019
IBM Research AI Hardware Center ... with Mukesh Khare of IBM
Mukesh V. KhareIBM
20 May, 2019