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Frontiers of Characterization and Metrology for Nanoelectronics

 NIST
  2nd-Jun-2016
Description: Advancing Metrology for Nanoelectronics... Working with industry, academia, and other government agencies to safely exploit the benefits of nanotechnology. Modern CMOS technologies are assemblies of complex three dimensional structures which incorporate precise layers of materials to enable the desired performance (Fig. 1). Metrology is essential to enable process control, calibration of process simulations, and debug of potential problems. Future devices, interconnects, and computational architectures will drive new challenges for metrology including the need to image in three dimensions with nanometer resolution and to characterize functionality with measurement of new material properties such as spin state and domain orientation.
Views: 4802
Domain: Electronics
Category: Semiconductors
Contributing Organization: NIST
 ‐ More of their Presentations
Contents:
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Committee Co-Chairs

David Seiler
National Institute of
Standards and Technology
(NIST)

Alain Diebold
College o ... See more