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Immersion Imaging and the New Limits of Optical Lithography

 Chris Mack
  17th-Jan-2007
Views: 4677
Domain: Electronics
Category: Semiconductors
Contents:
Immersion Imaging and the New Limits of Optical Lithography
Chris A. Mack, www.lithoguru.com
The relentless push of lithography towards smaller features requires enormous efforts in multiple domains. The methods for improving resolution are conveniently broken down into three categories with the aid of the Rayleigh resolution equation:

R = k1




NA

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