Luminescent Names Well-Known Lithography Expert

 David Lammers
  1st-Dec-2006

PALO ALTO, Calif., Nov. 27 /PRNewswire/ -- Luminescent Technologies, Inc., a provider of lithography-enhancement products to the global semiconductor industry, today named well-known lithography expert Bob Gleason, Ph.D., as managing director of engineering. Dr. Gleason joins Luminescent from Intel Corp., where he led the development of methods for tape-out and mask pattern data-preparation. Reporting to Dr. Moris Kori, executive vice president for products, Gleason will help drive the integration of Luminescent's technologies within its customers' manufacturing environments.

Dr. Gleason comes to Luminescent as the company transitions its patented Inverse Lithography Technology (ILT) products from evaluation stage to full production at select semiconductor-manufacturing sites. A radical
new-generation Resolution Enhancement Technology (RET) software, ILT is targeted for 45- and 32-nm integrated circuit (IC) designs and was developed to replace model-based optical proximity correction (OPC) techniques. At multiple evaluation sites, ILT is already demonstrating its unique capability to
widely expand lithography process windows while simultaneously optimizing IC designs for mask manufacturability.

"Bob has built a superb reputation for carrying advanced lithography technology initiatives through development and into manufacturing," said Luminescent's Kori. "He will apply his considerable engineering expertise to ensure the quality and integrity of our products in production. His impressive lithography credentials, coupled with a unique understanding of sub-wavelength mask synthesis challenges on the manufacturing side, will also make him an invaluable technology resource for our customers."

Before joining Luminescent, Dr. Gleason spent seven years as an engineering manager at Intel Corp. While there, he led a team of 40 software and CAD engineers developing software and methods used to transform IC designs into mask pattern data. He represented Intel on the SEMI task force that developed the OASIS pattern data format, and led the introduction of OASIS at Intel. He also served on the technical team responsible for Intel's lithography strategy.


Prior to Intel, Dr. Gleason spent more than two decades at Hewlett-Packard Co., where he held technical and engineering management roles in multiple divisions, including the ULSI laboratory, the circuit technology group and the optoelectronics division. His projects included the development of phase-shift masks, proximity compensation, and other resolution enhancements used in advanced lithography. His final position at HP was project manager and scientist in the ULSI research laboratory, where he established and led a research team focused on deep sub-micron lithography, reactive-ion etching, and metrology.

Throughout his career, Dr. Gleason has represented his employers on numerous industry consortia advisory boards. These roles included:
co-chairman of the Sematech Lithography Technical Advisory Board; chairman of the Semiconductor Research Corporation's Lithography Science Technical Advisory Board; and Member of the SIA Lithography Technical Working Group, which developed the 1997 National Road Map for Semiconductors.

Dr. Gleason holds a Ph.D. degree in physics, along with a Bachelor of Arts and Master of Arts degree, all from Rice University, Texas.

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Domain: Electronics
Category: Semiconductors
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