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Non-Contact SPV-based Method for Advanced Ion Implant Process Control

 Fabrizio Pennella, Pio Pianezza, Edward Tsidikovski, Gerard Krzych, Kenneth Steeples
  30th-Aug-2007
Views: 1650
Domain: Electronics
Category: Semiconductors
Contents:
Non-Contact SPV-based Method for Advanced Ion Implant Process Control
Fabrizio Pennella,* Pio Pianezza,* Edward Tsidikovski,** Gerard Krzych,** Kenneth Steeples**
*

Micron Technology Italia, S.r.I., 67051 Avezzano AQ, Italy ** QC Solutions Inc., Billerica MA 01821, USA
Abstract

Surface photo voltage (SPV) measurement has become an important semiconductor characterization tool due to the availabi ... See more

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