Oxygen transfer from metal gate to high-k gate, dielectric stack: Interface structure & property cha

 Jeong-Hee Ha, Husam AlShareef, Jim Chambers, Yun Sun, Piero Pianetta, Paul C. McIntyre, and Luigi Co
  20th-Sep-2007
Views: 2065
Domain: Electronics
Category: Semiconductors
Contents:
Oxygen transfer from metal gate to high-k gate dielectric stack: Interface structure & property changes Jeong-Hee Ha1, Husam AlShareef2, Jim Chambers , Yun Sun , Piero Pianetta , Paul C. McIntyre1, and Luigi Colombo2
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substrate and increases the interfacial oxide. TEM (see Fig. 1), FTIR, and synchrotron radiation photoemission spectroscopy (SR-PES) results all indicate the same trend of ox ... See more

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