Go to Page # Page of 22

Application of EUV Diffraction Optics for Actinic Mask Inspection and Metrology

 Kenneth C. Johnson
  30th-Aug-2018
Description: A parallel spot‐scanning system could provide useful capabilities and benefits for actinic EUV inspection and metrology.
Views: 1588
Domain: Electronics
Category: Semiconductors
Contributing Organization: EUV Litho, Inc.
 ‐ More of their Presentations
Contents:
Application of EUV Diffraction Optics for
Actinic Mask Inspection and Metrology
Kenneth C. Johnson, KJ Innovation (kjinnovation@earthlink.net)
2018 EUVL Workshop P36 (euvlitho.com)

LPP (Adlyte, 0.5W in‐band @ IF)
microlens array
(2 million lenses)
focal point array

Actinic, Spot‐Scanning&n ... See more

EUV Source Optics with 100% OOB Exclusion

A phase‐Fresnel grating can separate long‐wave radiation out of the EUV light path for OOB exclusion, effectively operating the collector as a grating monochromator.

...
20 August, 2018