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Coherent EUV Imaging and Metrology with High-Harmonic Generation Sources

 Stefan Witte
  10th-Aug-2018
Description: High harmonic generation is a compact and versatile source of coherent EUV radiation for metrology.
Views: 1040
Domain: Electronics
Category: Semiconductors
Contributing Organization: EUV Litho, Inc.
 ‐ More of their Presentations
SEMICONDUCTOR ANALYTICS
Contents:
Coherent EUV imaging and metrology with
high-harmonic generation sources
Stefan Witte
Advanced Research Center for Nanolithography (ARCNL)
Vrije Universiteit Amsterdam

Metrology challenges in nanolithography




Next-generation lithographic devices are multilayer, often 3D structures
Such devices may contain many different materials, many of which optically opaque
Relative posi ... See more

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