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Mask 3D Effects First Experimental Measurements with NA 0.55 Anamorphic Imaging

 Vincent Wiaux, Vicky Philipsen, Eric Hendrickx
  27th-Aug-2018
Description: Model the SHARP tool accurately in a lithographic rigorous simulator to build confidence in the ability of the lithographic simulators to make predictions about lithographic scanners at higher NA.
Views: 1559
Domain: Electronics
Category: Semiconductors
Contributing Organization: EUV Litho, Inc.
 ‐ More of their Presentations
Contents:
MASK 3D EFFECTS
FIRST EXPERIMENTAL MEASUREMENTS WITH NA 0.55
ANAMORPHIC IMAGING
VINCENT WIAUX, VICKY PHILIPSEN, ERIC HENDRICKX
EUVL WORKSHOP. BERKELEY, JUNE 13th, 2018.

PUBLIC

EUV MASK 3D EFFECTS
EXPERIMENTAL MEASUREMENTS WITH NA 0.55 ANAMORPHIC IMAGING
MASK 3D EFFECTS /

NA 0.55 ANAMORPHIC /

IMAGING WITH SHARP

▪ Mask 3D effects important to EUV imaging

▪ At NA0.33, we measure on ... See more

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