Go to Page # Page of 5
loading

Non-Contact SPV-based Method for Advanced Ion Implant Process Control

 Fabrizio Pennella, Pio Pianezza, Edward Tsidikovski, Gerard Krzych, Kenneth Steeples
  30th-Aug-2007
Views: 1637
Domain: Electronics
Category: Semiconductors
Contents:
Non-Contact SPV-based Method for Advanced Ion Implant Process Control
Fabrizio Pennella,* Pio Pianezza,* Edward Tsidikovski,** Gerard Krzych,** Kenneth Steeples**
*

Micron Technology Italia, S.r.I., 67051 Avezzano AQ, Italy ** QC Solutions Inc., Billerica MA 01821, USA
Abstract

Surface photo voltage (SPV) measurement has become an important semiconductor characterization tool due to the availabi ... See more

Recent Presentations

...
16 July, 2019
...
15 July, 2019
Andrea Lati
12 July, 2019