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Applied Cost Modeling Spring 2011

 David Jimenez
  8th-Jun-2011
Description: The latest edition includes: “Mask Defect Inspection Strategies: Cost of Ownership Impacts on 193nm Litho Clusters.”
Views: 2419
Domain: Electronics
Category: Semiconductors
Maxims of Tech: Rules of Engagement for a Fast Changing Environment
Contents:
APPLIED
Information Exchange for Your Application & Use of Cost Modeling Since 1991

Co$t
MODELING
Mask Defect Inspection Strategies: Cost of Ownership Impacts on 193nm Litho Clusters
With this edition of Applied Cost Modeling, we are publishing the second installment in a series on mask defect inspection strategies. Those interested in the cost of ownership (COO) data files behind this study, or ... See more

"Applied Cost Modeling" Spring 2014

Wright Williams & Kelly, Inc. (WWK), the global leader in cost and productivity management software and consulting services, announced today that the latest edition of its much acc

David Jimenez
18 June, 2014

"Applied Cost Modeling" Winter 2014

Wright Williams & Kelly, Inc. (WWK), the global leader in cost and productivity management software and consulting services, announced today that the latest edition of its much acc

David Jimenez
18 March, 2014

"Applied Cost Modeling" Fall 2013

The latest edition includes the feature article: “When Capacity Buys are not an Option: Technical Trends in c-Si Cell Manufacturing and their Implications” and is presented as the

David Jimenez
19 December, 2013