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SRC GRC University Research Highlights - January 2008

 Dale Edwards, David Yeh, William Joyner, Kwok Ng, Scott List, Tim Wooldridge, Dan Herr
  15th-Apr-2008
Views: 2389
Domain: Electronics
Category: Semiconductors
Contents:
Research Highlights for the Month of January 2008

Computer Aided Design & Test Sciences
Technical Thrust: Logic & Physical Design
Research Highlight: Report on New OPC Algorithm and Predictive Modeling As the 193 nm lithography is likely to be used for 45 nm and even 32 nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies. Currently, there ... See more

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