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weVISION: VLSI's Annual Lithography Panel, with Nikon's Andrew Hazelton, Phil Ware from Canon, and Bill Arnold, of ASML (video)

Posted on: 11-Nov-2008

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Summary

VLSI Researchís nano-lithography panel on the trends, technology, and events, including 32nm half-pitch entering production and 22nm developments. See Nikonís Andrew Hazelton, Phil Ware from Canon, and Bill Arnold, of ASML discuss immersion, imprint, EUVL, computational litho; and hi-index fluids.

« Maxims: Technology business structures are fundame...

Maxims: To be really committed to profitability, ... »

About weQuest:
weQuest's are written by G Dan Hutcheson, his career spans more than thirty years, in which he became a well-known as a visionary for helping companies make businesses out of technology. This includes hundreds of successful programs involving product development, positioning, and launch in Semiconductor, Technology, Medicine, Energy, Business, High Tech, Enviorntment, Electronics, healthcare and Business devisions.

Short URL: https://www.wesrch.com/electronics/weqEL1FE2B

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