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2018 Survey of Semiconductor Mask Makers ... with Aki Fujimura of D2S

 Aki Fujimura     eBeam Initiative
  27129      Oct 16, 2018
Every year, the e-beam initiative runs a survey of industry luminaries and mask makers to assess the state of this critical part of the semiconductor industry. In this video, Dan Hutcheson has a conversation about what were this year’s most interesting findings with Aki Fujimura, who is CEO of D2S. Here are some highlights from the eBeam Initiative’s 2018 Annual Surveys that are discussed:

•    Respondents were optimistic about the state of the photomask market, expecting        
      significant growth into the future      
•    Mask output grew at double digit rates last year
•    EUV confidence and optimism remain high for high volume manufacturing by the end of …
•    EUV mask output more than doubled compared to last year and Yield improved to …
•    Expectations continue to grow around actinic inspection tool availability
•    Perceptions on the need for multi-beam mask writing (MBMW) remain strong
•    The usage of ILT (Inverse Lithography Technology) is perceived to have increased
•    No progress appears to have been made in mask turnaround time
•    Mask data prep time remains significantly higher at advanced nodes
•    Average mask write time for eBeam VSB writers increased
 
Link to the eBeam Initiative’s web page where the survey reports can be found: http://www.ebeam.org/home 

About weVISION: weVISION is a series of video interviews of visionaries by G Dan Hutcheson, his career spans more than thirty years, in which he became a well-known as a visionary for helping companies make businesses out of technology. This includes hundreds of successful programs involving product development, positioning, and launch in Semiconductor, Technology, Medicine, Energy, Business, High Tech, Environment, Electronics, healthcare and Business divisions.

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