Posted on: 20-May-2010
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MOCVD tool focused on delivering best CoO and yield. Automated wafer handling and new gas flow technology for film uniformity, high throughput, and best in class yield. Targeted at delivering a cost/lumen decline for MOCVD.
weQuest's are written by G Dan Hutcheson, his career spans more than thirty years, in which he became a well-known as a visionary for helping companies make businesses out of technology. This includes hundreds of successful programs involving product development, positioning, and launch in Semiconductor, Technology, Medicine, Energy, Business, High Tech, Enviorntment, Electronics, healthcare and Business devisions.
Short URL: https://www.wesrch.com/energy/weqTR18IX7