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BioMEMS and Microfluidics

 University of Crete
Description: Deposit Polymer (step 1): C4F8-based plasma is used to conformally deposit a few monolayers of PTFE-like fluorocarbon polymer across all surfaces Etch polymer (step 2): The plasma gas is then switched to SF6 that isotropically etches silicon (like typical RIE). Ions from the plasma bombard the surface of the wafer, removing the polymer. Increased ion energy in the vertical direction results in a much higher rate of removal of fluorocarbon from surfaces parallel to the wafer surface. Etch silicon (step 3): Following selective polymer removal, the silicon surface at the base of the trench is exposed to reactive fluorine-based species that isotropically etch the unprotected silicon. The remaining fluorocarbon polymer protects the vertical walls of the trench from etching.
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Domain: Medical
Category: Implants
Contributing Organization: University of Crete
 ‐ More of their Presentations
BioMEMS (and Microfluidics)

Microfluidics &
Implantable sensors


Accelometers &
Inject Heads

Filters &

Optical MEMS
Mirrors &

History of MEMS Technology

BioMEMS is a relatively new field…
Image taken from: http://www.rfmems.net/a/MEMS/20100411/58.html


Silic ... See more

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