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BioMEMS and Microfluidics

 University of Crete
  10th-May-2017
Description: Deposit Polymer (step 1): C4F8-based plasma is used to conformally deposit a few monolayers of PTFE-like fluorocarbon polymer across all surfaces Etch polymer (step 2): The plasma gas is then switched to SF6 that isotropically etches silicon (like typical RIE). Ions from the plasma bombard the surface of the wafer, removing the polymer. Increased ion energy in the vertical direction results in a much higher rate of removal of fluorocarbon from surfaces parallel to the wafer surface. Etch silicon (step 3): Following selective polymer removal, the silicon surface at the base of the trench is exposed to reactive fluorine-based species that isotropically etch the unprotected silicon. The remaining fluorocarbon polymer protects the vertical walls of the trench from etching.
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Domain: Medical
Category: Implants
Contributing Organization: University of Crete
 ‐ More of their Presentations
Maxims of Tech: Rules of Engagement for a Fast Changing Environment
Contents:
BioMEMS (and Microfluidics)

Microfluidics &
Implantable sensors

BioMEMS

‘Traditional’
MEMS
Accelometers &
Inject Heads

MEMS
Technology
RF MEMS
Filters &
Varactors

Optical MEMS
(MOEMS)
Mirrors &
Switches

History of MEMS Technology

BioMEMS is a relatively new field…
Image taken from: http://www.rfmems.net/a/MEMS/20100411/58.html

POLYMERS

SILICON & ITS
DERIVATIVES
Silic ... See more

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